Company Filing History:
Years Active: 2002
Title: The Innovations of Patrick G Kofron
Introduction
Patrick G Kofron is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of materials science, particularly in the development of coatings for reflective mask substrates. His innovative work has led to advancements in defect inspection and surface finishing in the semiconductor industry.
Latest Patents
Kofron holds a patent for a process involving coatings on reflective mask substrates. This patent focuses on depositing a coating on one or both sides of a low thermal expansion material EUVL mask substrate. The aim is to improve defect inspection, surface finishing, and defect levels. Additionally, a high dielectric coating is applied to the backside to facilitate electrostatic chucking and correct for any bowing caused by stress imbalances. The process may also involve depositing a film, such as TaSi, to balance stress on the substrate.
Career Highlights
Kofron is affiliated with the University of California, where he continues to engage in research and development. His work has been instrumental in enhancing the performance of mask substrates used in advanced lithography techniques. With a focus on innovation, he has contributed to the evolution of semiconductor manufacturing processes.
Collaborations
Kofron has collaborated with notable colleagues, including William Man-Wai Tong and John S Taylor. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in the field.
Conclusion
Patrick G Kofron's contributions to the field of materials science and semiconductor technology are noteworthy. His innovative patent on coatings for reflective mask substrates exemplifies his commitment to advancing the industry. Through his work at the University of California and collaborations with esteemed colleagues, Kofron continues to make a significant impact in his field.