Company Filing History:
Years Active: 2010
Title: Innovations by Patrick F. Stone
Introduction
Patrick F. Stone is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his expertise and innovative thinking.
Latest Patents
His latest patents include advancements in semiconductor thermal process control. The first patent describes a method where a rotating semiconductor substrate is radiated according to a thermal recipe. Temperature measurements are taken along with the substrate's position during each measurement. This process allows for the determination of whether specific temperature measurements should be filtered. The radiation of the substrate is then controlled based on these measurements and the thermal recipe. The second patent focuses on semiconductor thermal process control utilizing a position-oriented temperature-generated thermal mask, which follows a similar methodology to ensure precision in the fabrication process.
Career Highlights
Patrick F. Stone is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has contributed to the advancement of technologies that are critical for modern electronics.
Collaborations
He has collaborated with notable colleagues such as Wolfgang R. Aderhold and Balasubramanian Ramachandran, further enhancing the innovative environment in which he works.
Conclusion
Patrick F. Stone's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence in the field. His work continues to influence the industry and pave the way for future advancements.