The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Sep. 12, 2002
Wolfgang R. Aderhold, Cupertino, CA (US);
Balasubramanian Ramachandran, Santa Clara, CA (US);
Leonid M. Tertitski, San Jose, CA (US);
Patrick F. Stone, Fremont, CA (US);
Wolfgang R. Aderhold, Cupertino, CA (US);
Balasubramanian Ramachandran, Santa Clara, CA (US);
Leonid M. Tertitski, San Jose, CA (US);
Patrick F. Stone, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.