This inventor holds 3 USPTO granted patents. Top assignee: Samsung Sds America, Inc.. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2025
Title: Patrick David Bangert: Innovator in Machine Vision Technology
Introduction
Patrick David Bangert is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of machine vision technology, holding a total of 3 patents. His work focuses on enhancing the capabilities of machine learning models, particularly in the areas of semantic segmentation and object discovery.
Latest Patents
One of his latest patents is titled "Bayesian semantic segmentation active learning with beta approximation." This invention involves training a machine vision model using an acquisition function that identifies unlabelled pixels with high uncertainty. The iterative process allows for accurate labeling of data images while utilizing very few labeled pixels.
Another significant patent is "Object discovery using an autoencoder." This innovation addresses the challenges of supervised learning by employing patches to discover objects in unlabeled training images. The AI-driven approach replaces manual training steps with a machine-centric process, effectively identifying frequent objects such as human faces, bodies, animals, and vehicles from unorganized data images.
Career Highlights
Patrick currently works at Samsung SDS America, Inc., where he continues to develop cutting-edge technologies in machine vision. His expertise in the field has positioned him as a key player in advancing AI applications.
Collaborations
He has collaborated with talented coworkers, including Heng Hao and Sima Didari, contributing to the innovative projects at Samsung.
Conclusion
Patrick David Bangert's work in machine vision technology exemplifies the impact of innovative thinking in the field of artificial intelligence. His patents reflect a commitment to enhancing machine learning capabilities, paving the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile