Oak Park, IL, United States of America

Patrick Boehnke

This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignee: Eta Vision Inc.. Active years: 2020-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Patrick Boehnke. Retrieved from https://idiyas.com/inventor/patrick-boehnke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2020-2022

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Patrick Boehnke: Inventor of Environmental Monitoring Systems

Introduction

Patrick Boehnke is an inventor based in Oak Park, Illinois. His patent work includes systems for monitoring and improving environmental conditions in data centers and similar facilities. He is associated with Eta Vision Inc. and holds 3 patents.

Latest Patents

Boehnke’s listed patent, “Systems and Methods for Sensing, Recording, Analyzing and Reporting Environmental Conditions in Data Centers and Similar Facilities,” describes hardware and software that collect environmental and other data from sensors and devices distributed throughout a facility. The system analyzes and displays the information in a detailed status report, then can recommend measures to improve facility efficiency.

Career Highlights

Boehnke’s patent portfolio reflects an emphasis on applying sensing technology and data analysis to facility operations. The described system brings together data collection, reporting, and recommendations to help users assess environmental conditions and identify potential efficiency improvements.

Collaborations

Boehnke is associated with Eta Vision Inc. His listed coworkers include Michael Conaboy and Kaveh Asalian.

Conclusion

Patrick Boehnke’s patent work focuses on using sensor data and software analysis to help facilities understand their environmental conditions and pursue greater efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…