Pessac, France

Patrick Beaure D'Augeres

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Centre National De La Recherche Scientifique, Commissariat a L'energie Atomique Et Aux Energies Alternatives, Université Lille I Sciences Et Technologies. Active years: 2018.


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovations of Patrick Beaure D'Augeres

Introduction

Patrick Beaure D'Augeres is a notable inventor based in Pessac, France. He has made significant contributions to the field of optical technology, particularly through his innovative patent in optical parametric amplification.

Latest Patents

One of his key inventions is the optical parametric ultrashort pulse amplifier. This device includes an emitter that emits non-monochromatic light pulses as a pump wave. It features a stretcher that receives the pump wave and outputs a stretched version of it. Additionally, a waveguide is incorporated to receive the stretched pump wave and chirped pulses, ultimately providing a wave resulting from four-wave mixing. This invention showcases his expertise in manipulating light for advanced applications.

Career Highlights

Throughout his career, Patrick has worked with prestigious organizations such as the Commissariat à l'Énergie Atomique et aux Énergies Alternatives and the Centre National de la Recherche Scientifique. His work in these institutions has allowed him to explore and develop cutting-edge technologies in the field of energy and scientific research.

Collaborations

Patrick has collaborated with notable colleagues, including Emmanuel Hugonnot and Damien Bigourd. These partnerships have contributed to the advancement of his research and innovations.

Conclusion

Patrick Beaure D'Augeres is a distinguished inventor whose work in optical parametric amplification has made a significant impact in the field. His contributions continue to influence advancements in technology and research.

Profile summary based on public USPTO records.
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