Swindon, United Kingdom

Patrick Alan Fletcher

This inventor holds 1 USPTO granted patent. Top assignee: Aea Technology Inc.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Patrick Alan Fletcher. Retrieved from https://idiyas.com/inventor/patrick-alan-fletcher

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Patrick Alan Fletcher and Radioactive Effluent Treatment.

Introduction

Patrick Alan Fletcher is an inventor associated with Swindon, Great Britain, and AEA Technology Inc. His recorded patent concerns an electrochemical method for treating radioactive effluent.

Latest Patents

Fletcher’s listed patent, “Radioactive Effluent Treatment,” describes a process for removing technetium and/or ruthenium from a high-pH radioactive waste stream containing fission products and organic complexants. The method first electrolytically oxidizes the organic materials at an anodically stable anode, then electrolytically reduces the targeted elements at a porous, fluid-permeable cathode, which may be made of lead wool. His recorded portfolio includes 1 patent.

Career Highlights

The available information links Fletcher’s work to AEA Technology Inc. and highlights his contribution to a specialized approach to radioactive waste treatment. The patent focuses on addressing organic complexants before recovering technetium and/or ruthenium through electrochemical reduction.

Collaborations

Fletcher’s listed coworkers include Christopher Peter Jones and Paul Antony Fennell. Their names provide context for the professional network associated with his work.

Conclusion

Patrick Alan Fletcher’s recorded invention applies sequential electrochemical steps to the treatment of radioactive effluent, with the aim of removing technetium and/or ruthenium from complex waste streams.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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