Company Filing History:
Years Active: 2001
Title: Patricia Stokley: Innovator in Semiconductor Technology
Introduction
Patricia Stokley is a notable inventor based in Aloha, Oregon, recognized for her contributions to semiconductor technology. She has made significant strides in the field, particularly with her innovative patent that enhances the performance of MOS transistors.
Latest Patents
Stokley's most recent patent is titled "Method of patterning a layer for a gate electrode of a MOS transistor." This invention provides a structure that includes a semiconductor substrate, a gate oxide layer, and a polysilicon layer. A masking layer is formed on the polysilicon layer and is patterned into a mask using conventional photolithographic techniques. The innovation lies in the use of a carbon-free mask for patterning the polysilicon layer, which minimizes breakthrough through the gate oxide layer. This advancement allows for the use of thinner gate oxide layers, resulting in transistors with lower threshold voltages. Stokley holds 1 patent for this groundbreaking work.
Career Highlights
Patricia Stokley is currently employed at Intel Corporation, where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in developing more efficient and effective transistor designs, which are crucial for modern electronic devices.
Collaborations
Throughout her career, Stokley has collaborated with esteemed colleagues, including Robert S. Chau and Thomas A. Letson. These partnerships have fostered an environment of innovation and have contributed to the advancement of semiconductor research.
Conclusion
Patricia Stokley is a pioneering inventor whose work in semiconductor technology has made a lasting impact on the industry. Her innovative approaches to MOS transistor design exemplify the importance of creativity and collaboration in scientific advancement.