Kuopio, Finland

Pasi Kvick

This inventor holds 1 USPTO granted patent. Top assignee: Sulzer Management Ag. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pasi Kvick. Retrieved from https://idiyas.com/inventor/pasi-kvick

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Pasi Kvick: Innovator in Fluid Monitoring Technology

Introduction

Pasi Kvick is a notable inventor based in Kuopio, Finland. He has made significant contributions to the field of fluid monitoring technology. His innovative approach has led to the development of a unique probe designed for monitoring the surface level of fluids in various vessels.

Latest Patents

Pasi Kvick holds a patent for a "Probe for monitoring the surface level of a fluid in a vessel and a method of installing the probe in the vessel." This patent outlines a method for installing a probe from outside the vessel, which includes several steps to ensure accurate monitoring of fluid levels. The probe's design allows for efficient installation and reliable performance in various applications.

Career Highlights

Pasi Kvick is currently associated with Sulzer Management AG, where he continues to innovate and develop new technologies. His work has been instrumental in advancing fluid monitoring solutions, making him a valuable asset to his company and the industry.

Collaborations

Throughout his career, Pasi has collaborated with talented individuals such as Seppo Nyman and Reijo Vesala. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Pasi Kvick's contributions to fluid monitoring technology exemplify the spirit of innovation. His patent and ongoing work at Sulzer Management AG highlight his commitment to advancing this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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