Berdorf, Luxembourg

Pascal Schmalen

This inventor holds 1 USPTO granted patent. Top assignee: Iee International Electronics and Engineering S.a.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pascal Schmalen. Retrieved from https://idiyas.com/inventor/pascal-schmalen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Pascal Schmalen: Patent Work in Conductive Structures

Introduction

Pascal Schmalen is an inventor based in Berdorf, Luxembourg. His patent work includes a method for producing electrically conductive structures on three-dimensional objects while maintaining low topography and surface roughness. He is associated with IEE International Electronics and Engineering S.A.

Latest Patents

Schmalen is named on one patent: “Method of Furnishing Three-Dimensional Objects with Electrically Conductive Structures Having Low Topography and Low Surface Roughness.”

The method begins with a flat plastic substrate. Tracks are printed to define the intended paths of the structured members, using a material that adheres strongly to both the substrate and the conductive material. A masking material is also printed directly onto the substrate. Its adherence to the plastic is greater than its adherence to the conductive material.

An atmospheric plasma spray process then applies conductive material over the tracks and adjacent portions of the masking material. A cleaning process removes conductive material from at least those adjacent masked portions. The approach is designed to produce conductive structures with low topography and low surface roughness.

Career Highlights

Schmalen’s listed patent count is 1 patent. The patent describes a manufacturing process that combines printed tracks, selective material adhesion, plasma spraying, and cleaning to form conductive structures on plastic substrates.

Collaborations

Schmalen is associated with IEE International Electronics and Engineering S.A. His listed coworker is Driss Chabach.

Conclusion

Pascal Schmalen’s patent focuses on a process for creating finely structured conductive features on plastic, with attention to surface smoothness and low profile.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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