This inventor holds 1 USPTO granted patent. Top assignee: Iee International Electronics and Engineering S.a.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Pascal Schmalen: Patent Work in Conductive Structures
Introduction
Pascal Schmalen is an inventor based in Berdorf, Luxembourg. His patent work includes a method for producing electrically conductive structures on three-dimensional objects while maintaining low topography and surface roughness. He is associated with IEE International Electronics and Engineering S.A.
Latest Patents
Schmalen is named on one patent: “Method of Furnishing Three-Dimensional Objects with Electrically Conductive Structures Having Low Topography and Low Surface Roughness.”
The method begins with a flat plastic substrate. Tracks are printed to define the intended paths of the structured members, using a material that adheres strongly to both the substrate and the conductive material. A masking material is also printed directly onto the substrate. Its adherence to the plastic is greater than its adherence to the conductive material.
An atmospheric plasma spray process then applies conductive material over the tracks and adjacent portions of the masking material. A cleaning process removes conductive material from at least those adjacent masked portions. The approach is designed to produce conductive structures with low topography and low surface roughness.
Career Highlights
Schmalen’s listed patent count is 1 patent. The patent describes a manufacturing process that combines printed tracks, selective material adhesion, plasma spraying, and cleaning to form conductive structures on plastic substrates.
Collaborations
Schmalen is associated with IEE International Electronics and Engineering S.A. His listed coworker is Driss Chabach.
Conclusion
Pascal Schmalen’s patent focuses on a process for creating finely structured conductive features on plastic, with attention to surface smoothness and low profile.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile