Dagneux, France

Pascal Poulleau

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Hexcel Composites Limited. Active years: 2020.

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Pascal Poulleau

Introduction

Pascal Poulleau is a notable inventor based in Dagneux, France. He has made significant contributions to the field of moulding technology. His innovative approach has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Pascal Poulleau holds a patent for a mould designed for the production of articles. This mould features a cavity for retaining fibrous material that is impregnated with a curable resin. The design includes a top, a base, and side walls, along with an internal insert that has sectional walls capable of moving independently. This innovative feature allows for the exertion of pressure on the fibrous material, enhancing the moulding process.

Career Highlights

Throughout his career, Pascal has worked with prominent companies in the composites industry. Notably, he has been associated with Hexcel Composites Limited and Hexcel Reinforcements Sas. His experience in these organizations has contributed to his understanding of advanced materials and moulding techniques.

Collaborations

Pascal Poulleau has collaborated with talented individuals in his field, including Mayeul Ducrot and Laurent Barnier. These partnerships have likely enriched his work and fostered innovation in his projects.

Conclusion

Pascal Poulleau is a distinguished inventor whose work in moulding technology has made a significant impact. His patent reflects his innovative spirit and dedication to advancing the industry. Through his collaborations and career experiences, he continues to inspire others in the field of invention.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…