This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Sick Ag. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: The Innovative Contributions of Pascal Ortwein
Introduction
Pascal Ortwein is a notable inventor based in Waldkirch, Germany. He has made significant contributions to the field of measurement technology, particularly in the determination of gas concentrations. His innovative approach has led to the development of a unique measurement apparatus that enhances accuracy and efficiency.
Latest Patents
Ortwein holds a patent for a two-channeled measurement apparatus. This invention relates to a measurement apparatus designed for the determination of gas concentrations. The apparatus features two spectral channels, which are separated by a single chopper wheel. The chopper wheel serves multiple functions, including aligning the light from two sources along the same measuring path and associating the light to the corresponding receiver. Additionally, it employs a chopper function to utilize the lock-in technique and facilitates an easy zero point correction.
Career Highlights
Pascal Ortwein is currently associated with Sick AG, a company renowned for its advancements in sensor technology and automation solutions. His work at Sick AG has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for excellence in measurement technology.
Collaborations
Ortwein has collaborated with notable colleagues, including Florian Brüchig and Rolf Disch. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Pascal Ortwein's contributions to measurement technology exemplify the spirit of innovation. His patent for a two-channeled measurement apparatus showcases his ability to address complex challenges in gas concentration measurement. Through his work at Sick AG and collaborations with talented colleagues, Ortwein continues to make a significant impact in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
