Company Filing History:
Years Active: 2007
Title: The Innovations of Pascal Louis
Introduction
Pascal Louis is a notable inventor based in Longjumeau, France. He has made significant contributions to the field of memory storage technology, particularly with his innovative work on MRAM (Magnetoresistive Random Access Memory) storage devices. His expertise and creativity have led to the development of a patented technology that enhances data storage capabilities.
Latest Patents
Pascal Louis holds a patent for a MRAM storage device. This device comprises a substrate, on or above which a plurality of word lines, a plurality of bit lines, a plurality of memory cells, and a plurality of isolation diodes are provided. Each memory cell forms a resistive cross point of one word line and one bit line, respectively. Each memory cell is connected to one isolation diode, creating a unidirectional conductive path from a word line to a bit line via the corresponding memory cell. The substrate, at least a part of the word lines or at least a part of the bit lines, and the isolation diodes are realized as one common monocrystal semiconductor block. This innovative design offers improved efficiency and performance in data storage.
Career Highlights
Throughout his career, Pascal Louis has worked with prominent companies in the technology sector. He has been associated with Infineon Technologies AG and Altis Semiconductor, where he has contributed to various projects and advancements in semiconductor technology. His work has been instrumental in pushing the boundaries of what is possible in memory storage solutions.
Collaborations
Pascal has collaborated with notable professionals in his field, including Richard Ferrant and Daniel Braun. These collaborations have allowed him to share ideas and innovate further in the realm of memory technology.
Conclusion
Pascal Louis is a distinguished inventor whose work on MRAM storage devices has made a significant impact in the field of data storage technology. His innovative approach and collaborations with industry professionals continue to inspire advancements in this critical area.