Cessy, France

Pascal Letourneau


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2001-2007

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Pascal Letourneau: A Pioneer in Abrasive Compositions

Introduction

Pascal Letourneau, an accomplished inventor based in Cessy, France, is recognized for his significant contributions to the electronics industry through innovative abrasive compositions. With a total of five patents to his name, Letourneau has played a pivotal role in enhancing mechanical chemical polishing processes used in the integrated circuits sector.

Latest Patents

Among his notable patents, the latest includes an abrasive composition specifically designed for the integrated circuit electronics industry. This invention details an aqueous acid suspension of individualized colloidal silica particles that are not linked by siloxane bonds. It also incorporates an abrasive surfactant aimed at improving mechanical chemical polishing techniques. Additionally, his patent outlines a fabric impregnated with this advanced composition and describes a novel process for mechanical chemical polishing.

Career Highlights

Letourneau's career boasts significant affiliations with prominent companies, including Clariant and Az Electronic Materials USA Corporation. His expertise in developing innovative materials has greatly contributed to advancements in the technology utilized in electronics manufacturing.

Collaborations

Throughout his career, Pascal Letourneau has collaborated with industry professionals such as Eric Jacquinot and Maurice Rivoire. These partnerships have not only facilitated the exchange of ideas but also fostered a collaborative environment that propels innovation in the field.

Conclusion

Pascal Letourneau stands out as a remarkable inventor whose work in abrasive compositions for integrated circuits has had a lasting impact on the electronics industry. His dedication to innovation continues to inspire future developments, and his patents pave the way for advancements in mechanical chemical polishing processes, demonstrating the importance of creativity and collaboration in technological progress.

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