Rimouski, Canada

Pascal Le-Huu

This inventor holds 1 USPTO granted patent. Top assignee: Cae Electronics Ltd.. Active years: 1999.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Innovations by Pascal Le-Huu in Motion Simulation Technology.

Introduction

Pascal Le-Huu is an innovative inventor based in Rimouski, Canada. He has made significant contributions to the field of motion simulation, particularly in the design of seats for motion simulators. His work focuses on enhancing the realism of motion cues experienced by pilots during simulation.

Latest Patents

Pascal Le-Huu holds a patent for a "Seat for motion simulator and method of motion simulation." This invention introduces a new motion cueing scheme that has been adapted to an actual aircraft production seat. The design provides both transient and sustained heave acceleration cues, making the simulation experience more realistic. The mechanism is simple and compact, allowing for easy implementation on G-seats. Changes in seat pan pitch angle, synchronized with seat back vertical displacement, create cues that consistently reproduce the physiological and physical effects experienced by pilots subjected to real heave acceleration. He has 1 patent to his name.

Career Highlights

Pascal Le-Huu has worked at CAE Electronics Ltd., a company known for its advancements in simulation technologies. His role involves developing innovative solutions that enhance the training experience for pilots and other professionals in the aviation industry.

Collaborations

Pascal collaborates with Louis-Joseph Mathieu, contributing to the development of cutting-edge technologies in motion simulation.

Conclusion

Pascal Le-Huu's work in motion simulation technology exemplifies the impact of innovative thinking in enhancing pilot training experiences. His contributions continue to shape the future of simulation technology.

Profile summary based on public USPTO records.
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