Foster City, CA, United States of America

Paolo deCecco

This inventor holds 1 USPTO granted patent. Top assignee: Revara, Incorporated. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paolo deCecco. Retrieved from https://idiyas.com/inventor/paolo-dececco

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Paolo deCecco: Innovator in Non-Destructive Distribution Profiling

Introduction

Paolo deCecco is a notable inventor based in Foster City, CA (US). He has made significant contributions to the field of materials science, particularly in the area of film analysis. His innovative approach has led to the development of a unique method for non-destructive distribution profiling of elements in films.

Latest Patents

Paolo deCecco holds a patent for a "Method and system for non-destructive distribution profiling of an element in a film." This method involves exciting the electron energy of an element deposited in a film, obtaining a spectrum associated with that energy, and processing it to remove background noise. The processed spectrum is then matched to a simulated spectrum with a known distribution profile, allowing for accurate profiling of the element in the film.

Career Highlights

Paolo is currently employed at Revara, Incorporated, where he continues to push the boundaries of innovation in his field. His work has garnered attention for its practical applications in various industries, including electronics and materials engineering.

Collaborations

Throughout his career, Paolo has collaborated with esteemed colleagues such as Bruno W Schueler and David Allen Reed. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Paolo deCecco's contributions to the field of non-destructive testing and analysis are noteworthy. His innovative methods and collaborative spirit continue to inspire advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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