This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: National Tsing Hua University. Active years: 2015.
Company Filing History:
Years Active: 2015
Title: Pao-Te Lin: Innovator in Laser Interference Lithography
Introduction
Pao-Te Lin is a distinguished inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of laser technology, particularly in the area of lithography. His innovative approach has led to advancements that enhance the precision and efficiency of laser applications.
Latest Patents
Pao-Te Lin holds a patent for a "Laser interference lithography apparatus using fiber as spatial filter and beam expander." This invention involves a laser source that provides a first laser beam, which is processed by an optics assembly into one or multiple second laser beams. The fiber assembly then transforms these second laser beams into stable coherent third laser beams, generating an interference pattern on the to-be-exposed object. Notably, this apparatus operates without a pinhole spatial filter and a beam expander along the optical path from the laser source to the exposure stage. He has 1 patent to his name.
Career Highlights
Pao-Te Lin is affiliated with National Tsing Hua University, where he continues to engage in research and development in laser technologies. His work has garnered attention for its innovative solutions and practical applications in various fields.
Collaborations
Throughout his career, Pao-Te Lin has collaborated with notable colleagues, including En-Chiang Chang and Tze-Bin Huang. These partnerships have contributed to the advancement of research and innovation in their respective areas of expertise.
Conclusion
Pao-Te Lin's contributions to laser interference lithography exemplify the impact of innovative thinking in technology. His work not only advances scientific understanding but also paves the way for future developments in the field.