Pankaj Hazarika

Title: Pankaj Hazarika: Innovator in Plasma Processing Technology

Introduction

Pankaj Hazarika is a notable inventor based in Fremont, CA. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique component that enhances the efficiency of plasma processing chambers.

Latest Patents

Hazarika holds a patent for a "Single crystal metal oxide plasma chamber component." This invention features a component of a plasma processing chamber that includes at least one plasma-facing surface made from single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable materials for this invention include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). Additionally, a single crystal metal oxide can be machined to form a gas injector for a plasma processing chamber. Hazarika has 1 patent to his name.

Career Highlights

Pankaj Hazarika is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role involves working on advanced technologies that improve plasma processing techniques. His expertise in this area has made him a valuable asset to his team.

Collaborations

Some of Hazarika's coworkers include Lin Xu and Douglas Detert. Their collaboration has contributed to the innovative projects at Lam Research Corporation.

Conclusion

Pankaj Hazarika's contributions to plasma processing technology exemplify the impact of innovation in the semiconductor industry. His patent for a single crystal metal oxide plasma chamber component showcases his commitment to advancing technology. Hazarika's work continues to influence the field and drive progress in plasma processing applications.