London, United Kingdom

Pankaj Daga

This inventor holds 1 USPTO granted patent. Top assignee: Ucl Business Plc. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pankaj Daga. Retrieved from https://idiyas.com/inventor/pankaj-daga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Pankaj Daga: Innovator in Magnetic Resonance Imaging

Introduction

Pankaj Daga is a notable inventor based in London, GB. He has made significant contributions to the field of magnetic resonance imaging (MRI) through his innovative patent. His work focuses on improving the quality of MRI images by addressing susceptibility artifacts.

Latest Patents

Pankaj Daga holds a patent for an "Apparatus and method for correcting susceptibility artefacts in a magnetic resonance image." This invention provides a method for performing phase unwrapping for acquired MR images. The method utilizes a Markov random field (MRF) to model the true and wrapped phases as random variables. It constructs a graph with vertices and edges to find the minimum energy configuration, which aids in phase unwrapping. The unwrapped phase can then be used to estimate a field map, enhancing the accuracy of MRI imaging.

Career Highlights

Pankaj Daga is associated with UCL Business Plc, where he applies his expertise in MRI technology. His innovative approach has led to advancements in the field, making significant impacts on medical imaging practices.

Collaborations

Pankaj collaborates with Sebastien Ourselin, a fellow expert in the field. Their combined efforts contribute to the development of cutting-edge solutions in MRI technology.

Conclusion

Pankaj Daga's contributions to magnetic resonance imaging through his innovative patent demonstrate his commitment to advancing medical technology. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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