Pan Yung Shuen

Title: Pan Yung Shuen: Innovator in Gas Filling Technology

Introduction

Pan Yung Shuen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of gas filling technology, particularly in the context of photomask boxes. His innovative approach has led to the development of a specialized apparatus that enhances the efficiency of gas filling processes.

Latest Patents

Pan Yung Shuen holds a patent for a "Gas filling apparatus for photomask box." This invention is designed to fill a photomask box with gases such as nitrogen or other inert gases. The apparatus features a gas filling chamber equipped with multiple first and second pillared elements, gas inlets, gas outlets, and clamping elements. The first pillared elements are intended to couple with recesses on the cover member of the photomask box, while the second pillared elements support the peripheral of the cover member. The clamping elements secure the cover member in place, allowing for efficient gas filling and exhausting through the designated holes.

Career Highlights

Pan Yung Shuen is currently employed at Gudeng Precision Industrial Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of gas filling systems in the semiconductor industry.

Collaborations

Pan Yung Shuen collaborates with his coworker, Li Shu Chen, to further enhance their projects and drive innovation within their company.

Conclusion

Pan Yung Shuen's contributions to gas filling technology exemplify the importance of innovation in the semiconductor industry. His patent for the gas filling apparatus demonstrates his commitment to improving processes and efficiency in this critical field.