Pai-Yu Chang

Title: Innovations of Pai-Yu Chang

Introduction

Pai-Yu Chang is an accomplished inventor based in Douliu, Taiwan. He has made significant contributions to the field of materials science, particularly in the fabrication of semiconductor structures. His innovative approach has led to advancements that can enhance the efficiency of solar energy conversion.

Latest Patents

One of Pai-Yu Chang's notable patents is titled "Method for fabricating P-type polycrystalline silicon-germanium structure." This patent describes a method that involves forming an aluminum layer and an amorphous germanium layer on a P-type monocrystalline silicon substrate. The process includes annealing these layers at a temperature between 400-650°C and utilizing an aluminum-induced crystallization process. This method is recognized for being simple, reliable, and cost-effective, allowing for the creation of a P-type polycrystalline silicon-germanium layer that can convert longer wavelengths of sunlight into electric energy.

Career Highlights

Pai-Yu Chang is affiliated with the National Yunlin University of Science and Technology, where he continues to engage in research and development. His work has not only contributed to academic knowledge but also has practical implications in the field of renewable energy.

Collaborations

One of his notable collaborators is Jian-Yang Lin, who has worked alongside him in various research projects. Their combined expertise has fostered advancements in semiconductor technology.

Conclusion

Pai-Yu Chang's innovative methods in semiconductor fabrication represent a significant step forward in energy conversion technologies. His contributions are paving the way for more efficient solar energy solutions.