This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Momentum Technical Consulting, Inc.. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Owen Hehmeyer: Inventor in Chemical-Mechanical Polishing
Introduction
Owen Hehmeyer is an inventor based in Austin, Texas. His patent work addresses vibration measurement and control during chemical-mechanical polishing (CMP), a process used to polish wafers.
Latest Patents
Hehmeyer is credited with 1 patent, titled “Method of and Apparatus for Chemical-Mechanical Polishing.” The invention measures vibration-related variations in the forces holding a wafer against a polishing pad and/or moving the pad and wafer relative to one another. It uses the standard deviation of those measurements to help minimize or eliminate the harmful effects of vibration during CMP.
Career Highlights
Hehmeyer is associated with Momentum Technical Consulting, Inc. His patented work focuses on improving CMP operations by using vibration measurements to address process disturbances.
Collaborations
His listed coworkers include Ralf B. Lukner and Ivan Kosik.
Conclusion
Owen Hehmeyer’s patent describes a measurement-based approach to reducing vibration-related effects in chemical-mechanical polishing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile