Scottsdale, AZ, United States of America

Otto Luedke

This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Otto Luedke. Retrieved from https://idiyas.com/inventor/otto-luedke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Otto Luedke - Innovator in Semiconductor Polishing Technology

Introduction

Otto Luedke is a notable inventor based in Scottsdale, AZ (US), recognized for his contributions to semiconductor technology. He has developed innovative methods that enhance the efficiency and quality of semiconductor substrate polishing.

Latest Patents

Luedke holds a patent for a "Method for polishing a semiconductor substrate." This improved method involves forming a protective layer on one major surface of a substrate, creating a protected side, while polishing the unprotected surface with a double-sided polisher. The process allows for material removal from the unprotected side at a faster rate than from the protected side, resulting in a single-side polished substrate with enhanced flatness characteristics.

Career Highlights

Throughout his career, Luedke has made significant advancements in the field of semiconductor manufacturing. His work has contributed to the development of more efficient polishing techniques, which are crucial for the production of high-quality semiconductor devices.

Collaborations

Luedke has collaborated with esteemed colleagues, including Fernando A Bello and James B Hall, to further enhance the innovations in semiconductor technology.

Conclusion

Otto Luedke's contributions to semiconductor polishing methods exemplify the importance of innovation in technology. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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