Torrance, CA, United States of America

Otto Albrecht

This inventor holds 2 USPTO granted patents. Top assignees: Daleco Research Development, Molecular Electronics Corporation. Active years: 1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Otto Albrecht. Retrieved from https://idiyas.com/inventor/otto-albrecht-4vvsnnk1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 1988

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2 patents (USPTO):Explore Patents

Title: **Innovator Otto Albrecht: Pioneering Advances in Monomolecular Layer Deposition**

Introduction

Otto Albrecht, an inventor based in Torrance, California, has made significant strides in the field of materials science. With a portfolio of two patents, his latest innovations focus on the efficient deposition of monomolecular layers, crucial for various applications in modern technology.

Latest Patents

One of Albrecht's notable patents is titled "Method and apparatus for depositing monomolecular layers on a substrate." The invention describes a method and apparatus for continuously forming and depositing monomolecular amphiphilic molecules on a substrate. This innovative approach utilizes non-moving or static mechanical components that do not come into direct contact with the monomolecular layer during the transfer and compression process. By enabling continuous drainage and replenishment of the liquid in the tank, the apparatus significantly reduces contamination, ensuring consistent quality and characteristics of the monolayers produced. This advancement not only enhances the efficiency of the process but also makes it commercially viable to supply a region with a solution of amphiphilic molecules and deposit them onto one or multiple substrates seamlessly.

Career Highlights

Throughout his career, Otto Albrecht has been associated with notable companies including Daleco Research Development and Molecular Electronics Corporation. His work has positioned him as a respectable figure in the field of molecular electronics, contributing to advancements that enhance the performance and reliability of molecular-based technologies.

Collaborations

Albrecht has collaborated with esteemed professionals such as Meir Bartur and Vladimir Rodov, together exploring innovative methodologies that further the understanding and applications of monomolecular layer deposition. Their teamwork highlights the importance of collaboration in driving technological progress and inventive solutions.

Conclusion

Otto Albrecht's contributions to the realm of monomolecular layer deposition underscore the significance of innovative thinking in material science. His patents reflect a commitment to enhancing efficiency and quality, proving invaluable for future applications in various technological sectors. As the industry evolves, Albrecht's work will undoubtedly inspire further research and development in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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