Tokyo, Japan

Osanori Mizonoue

This inventor holds 1 USPTO granted patent. Top assignee: Tdk Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osanori Mizonoue. Retrieved from https://idiyas.com/inventor/osanori-mizonoue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Osanori Mizonoue and Ferrite Sintered Magnet Innovation

Introduction

Osanori Mizonoue is an inventor associated with TDK Corporation in Tokyo, Japan. His patent work concerns ferrite sintered magnets and methods for producing them.

Latest Patents

The provided information lists one patent for Mizonoue: “Ferrite Sintered Magnet, Motor, and Method for Producing the Ferrite Sintered Magnet.” The invention describes a ferrite sintered magnet with a surface roughness Rz of 3.5 μm or less. Its production method mixes magnetic powders with at least a binder resin, injection-molds the mixture in a magnetic field using a mold surface with roughness of 2.0 μm or less, and then sinters the molded body. The patent also identifies a motor incorporating the magnet. Mizonoue is credited with 1 patent in the supplied data.

Career Highlights

Mizonoue’s listed patent connects his work at TDK Corporation with magnetic materials and manufacturing processes. The invention focuses on controlling surface roughness through mold design and production steps.

Collaborations

Yoshihiko Minachi and Hideyuki Umezawa are identified as Mizonoue’s coworkers. The supplied information does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Osanori Mizonoue’s listed patent highlights a manufacturing approach for producing ferrite sintered magnets with controlled surface roughness, reflecting his association with TDK Corporation’s work in magnetic technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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