Company Filing History:
Years Active: 2013
Title: Osamu Tonomura: Innovator in Semiconductor Manufacturing
Introduction
Osamu Tonomura is a prominent inventor based in Odamara, Japan. He is known for his significant contributions to the field of semiconductor manufacturing. With a focus on innovative methods, Tonomura has developed technologies that enhance the efficiency and effectiveness of semiconductor devices.
Latest Patents
Tonomura holds a patent for a "Method of manufacturing semiconductor device and substrate processing system." This method involves forming an aluminum-containing insulation film on an electrode film of a substrate through a series of processes. These processes include alternating the supply of aluminum precursors and oxidizing or nitriding precursors in a processing chamber. Additionally, a high permittivity insulation film is formed on the aluminum-containing insulation film, followed by heat treatment of the substrate. This innovative approach is crucial for advancing semiconductor technology.
Career Highlights
Osamu Tonomura has made significant strides in his career, particularly through his work at Hitachi Kokusai Electric Inc. His expertise in semiconductor manufacturing has positioned him as a key figure in the industry. Tonomura's dedication to innovation has led to advancements that benefit both his company and the broader technology sector.
Collaborations
Throughout his career, Tonomura has collaborated with notable colleagues, including Arito Ogawa and Sadayoshi Horii. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Osamu Tonomura's contributions to semiconductor manufacturing exemplify the spirit of innovation. His patented methods and collaborative efforts continue to influence the industry, paving the way for future advancements in technology.