Mobara, Japan

Osamu Sasaya

This inventor holds 9 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1982-1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Sasaya. Retrieved from https://idiyas.com/inventor/osamu-sasaya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.9

ph-index = 5

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 1982-1988

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9 patents (USPTO):Explore Patents

Title: Osamu Sasaya: Innovator in Photosensitive Compositions

Introduction

Osamu Sasaya is a notable inventor based in Mobara, Japan. He has made significant contributions to the field of photosensitive compositions, holding a total of 9 patents. His work has been instrumental in advancing technologies related to pattern formation and phosphor screens.

Latest Patents

Sasaya's latest patents include a photosensitive composition and a pattern forming process using the same. This innovative composition consists of at least one diazonium compound and at least one nitrate, which becomes sticky upon exposure to light. Another significant patent involves a process for forming a phosphor screen of a cathode ray tube. This process utilizes a lacquer film that enhances the adhesive strength of the metallic film while preventing color mixing and halation.

Career Highlights

Osamu Sasaya is associated with Hitachi, Ltd., where he has contributed to various research and development projects. His expertise in photosensitive materials has positioned him as a key player in the industry.

Collaborations

Sasaya has collaborated with notable colleagues such as Kiyoshi Miura and Masahiro Nishizawa. Their combined efforts have led to advancements in their respective fields.

Conclusion

Osamu Sasaya's innovative work in photosensitive compositions and related technologies has made a lasting impact on the industry. His contributions continue to influence advancements in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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