Location History:
- Yokohama, JP (1999)
- Sagamihara, JP (1983 - 2002)
Company Filing History:
7 out of 52,730 
1 out of 2,916 
Years Active: 1983-2002
Title: The Innovative Contributions of Osamu Sasaki
Introduction
Osamu Sasaki is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of photosensitive compositions, holding a total of eight patents. His work has been instrumental in advancing technologies related to photoresists and pattern formation.
Latest Patents
Sasaki's latest patents include a photosensitive composition containing a dissolution inhibitor and an acid-releasing compound. This innovative composition is designed to form fine resist patterns when used as photoresist. It comprises an acid-decomposable compound that reacts with an alkali solution, resulting in the formation of specific functional groups. Additionally, the composition may include an alkali-soluble polymer with a softening point of 150°C or more and an average molecular weight ranging from 3000 to 8000.
Career Highlights
Throughout his career, Osamu Sasaki has worked with notable companies such as Kabushiki Kaisha Toshiba and Tokyo Shibaura Denki Kabushiki Kaisha. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of photosensitive materials.
Collaborations
Sasaki has collaborated with talented individuals such as Naoko Kihara and Tsukasa Tada. These partnerships have contributed to the successful development of his patents and innovations.
Conclusion
Osamu Sasaki's contributions to the field of photosensitive compositions highlight his role as a leading inventor. His innovative patents and collaborations have significantly impacted the technology landscape, particularly in the area of photoresists.