Yokohama, Japan

Osamu Ohkawara

This inventor holds 4 USPTO granted patents. Top assignee: Nhk Spring Co., Ltd.. Active years: 2000-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Ohkawara. Retrieved from https://idiyas.com/inventor/osamu-ohkawara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 87(Granted Patents)


Location History:

  • Aikawa-machi, JP (2000 - 2001)
  • Yokohama, JP (2004 - 2008)

Company Filing History:


Years Active: 2000-2008

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4 patents (USPTO):Explore Patents

Title: Inventor Osamu Ohkawara

Introduction: Osamu Ohkawara is a renowned inventor based in Yokohama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Osamu Ohkawara holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With over two decades of experience in the industry, Osamu Ohkawara has worked with leading tech companies to develop cutting-edge solutions that have revolutionized various sectors. His inventions have significantly impacted the way we interact with technology on a daily basis.

Collaborations: Throughout his career, Osamu Ohkawara has collaborated with top researchers, engineers, and scientists from around the world to push the boundaries of innovation. His collaborative efforts have led to the development of groundbreaking technologies that have received international acclaim.

Conclusion: Osamu Ohkawara's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor in the tech industry. His contributions continue to inspire future generations of inventors and shape the landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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