Takarazuka, Japan

Osamu Nanba

This inventor holds 3 USPTO granted patents. Top assignee: Nippon Paint Compnay, Ltd.. Active years: 1993-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Nanba. Retrieved from https://idiyas.com/inventor/osamu-nanba-jccvajvl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1993-1994

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3 patents (USPTO):Explore Patents

Title: **Osamu Nanba: Innovator in Lithographic Printing Technologies**

Introduction

Osamu Nanba, a notable inventor based in Takarazuka, Japan, has made significant contributions to the field of lithographic printing through his innovative patent work. With a total of three patents to his name, Nanba has focused on developing advanced photosensitive diazo resins that enhance the efficiency and quality of printing processes.

Latest Patents

Among his most recent patents are two key innovations related to photosensitive diazo resin compositions. The first patent involves a photosensitive diazo resin-containing composition specifically designed for lithographic printing. This composition is characterized by a sensitizing dye that incorporates a counter ion of a diazonium group, which plays a crucial role in the printing process.

The second patent expands upon this concept by detailing a photosensitive diazo resin represented by a specific chemical formula. This resin is designed for lithographic printing and consists of a selected counter anion, a divalent bonding group, and various alkyl and phenyl groups. These innovations are set to improve the quality and consistency of lithographic prints.

Career Highlights

Osamu Nanba is associated with Nippon Paint Company, Ltd., where he has applied his expertise in resin technology to further enhance the company’s offerings in lithographic materials. His work has not only contributed to the company's portfolio but also to the advancement of printing technologies that serve various industries.

Collaborations

Throughout his career, Nanba has collaborated with esteemed colleagues such as Kazunori Kanda and Edward Lam. These partnerships have facilitated the sharing of ideas and techniques, leading to the successful development of new technologies in the realm of photosensitive materials.

Conclusion

With a solid foundation in resin chemistry and a commitment to innovation, Osamu Nanba continues to push the boundaries of lithographic printing technology. His patents represent significant advancements that will impact the industry positively, showcasing his role as a leading inventor in this specialized field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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