Yokohama, Japan

Osamu Nakazima

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Nakazima. Retrieved from https://idiyas.com/inventor/osamu-nakazima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Osamu Nakazima: Innovator in Polyamide Resin Technology

Introduction

Osamu Nakazima is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of impact-resistant polyamide resin compositions. His innovative work has led to advancements that are valuable in various industrial applications.

Latest Patents

Osamu Nakazima holds a patent for a novel impact-resistant polyamide resin composition and the process for its production. This composition is designed to enhance the durability and resilience of polyamide materials, making them suitable for demanding applications.

Career Highlights

Throughout his career, Nakazima has been associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work at Asahi Kasei has allowed him to focus on research and development, contributing to the company's reputation for innovation in materials.

Collaborations

One of his notable collaborators is Shinichi Izawa. Together, they have worked on projects that leverage their expertise in polymer science to create advanced materials.

Conclusion

Osamu Nakazima's contributions to the field of polyamide resin technology exemplify the impact of innovative thinking in materials science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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