Settsu, Japan

Osamu Nakajima

This inventor holds 1 USPTO granted patent. Top assignee: Nippon A&l Incorporated. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Nakajima. Retrieved from https://idiyas.com/inventor/osamu-nakajima-lms5tynx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Osamu Nakajima: Innovator in Chlorofluorocarbon Resistant Resin Composition

Introduction

Osamu Nakajima is a notable inventor based in Settsu, Japan. He has made significant contributions to the field of materials science, particularly in the development of resin compositions that resist chlorofluorocarbons. His innovative work has implications for various applications, including refrigeration.

Latest Patents

Osamu Nakajima holds a patent for a chlorofluorocarbon resistant resin composition and a refrigerator inner. This invention showcases his expertise in creating materials that can withstand the challenges posed by chlorofluorocarbons, which are known for their environmental impact.

Career Highlights

Nakajima is currently employed at Nippon A&L Incorporated, where he continues to push the boundaries of material innovation. His work at the company has positioned him as a key player in the development of advanced resin technologies.

Collaborations

Throughout his career, Nakajima has collaborated with esteemed colleagues such as Michio Hoshikawa and Tetsuya Yamamoto. These partnerships have fostered a creative environment that encourages the exchange of ideas and the advancement of technology.

Conclusion

Osamu Nakajima's contributions to the field of resin compositions highlight his innovative spirit and dedication to improving material performance. His work not only addresses current challenges but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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