Hachioji, Japan

Osamu Murata


Average Co-Inventor Count = 3.8

ph-index = 5

Forward Citations = 64(Granted Patents)


Location History:

  • Shiobara, JP (1990)
  • Hachioji, JP (1992 - 1993)
  • Tokyo, JP (1993 - 2005)
  • Hino, JP (1999 - 2009)

Company Filing History:


Years Active: 1990-2009

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10 patents (USPTO):Explore Patents

Title: Osamu Murata: Innovator in Ink-Jet Technology and Polishing Films

Introduction

Osamu Murata is a prominent inventor based in Hachioji, Japan. He has made significant contributions to the fields of ink-jet technology and polishing films, holding a total of 10 patents. His innovative designs and methods have advanced the capabilities of these technologies, making him a notable figure in the industry.

Latest Patents

Murata's latest patents include an advanced ink-jet head design. This ink-jet head features an ink emitting surface that is strategically positioned opposite to an ink supplying surface. The design incorporates piezo-electric driving walls that partition ink channels, enhancing the efficiency of ink emission. Additionally, he has developed a polishing film that consists of a plastic film and a specialized polishing layer. This layer contains a mixture of silica particles of varying diameters, which are fixed in a resin binder, allowing for improved polishing performance.

Career Highlights

Throughout his career, Osamu Murata has worked with notable companies such as Konica Corporation and Seiko Instruments Inc. His experience in these organizations has contributed to his expertise and innovation in the field. His work has not only advanced technology but has also set new standards in product quality and performance.

Collaborations

Murata has collaborated with esteemed colleagues, including Yoshikazu Maekawa and Masanobu Kawano. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Osamu Murata's contributions to ink-jet technology and polishing films exemplify his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in his field.

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