Company Filing History:
Years Active: 2013-2014
Title: Osamu Matsuda: Innovator in Semiconductor Technology
Introduction
Osamu Matsuda is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 3 patents, Matsuda has focused on developing solutions that enhance semiconductor manufacturing processes.
Latest Patents
Matsuda's latest patents include an etching agent, etching method, and a liquid for preparing the etching agent. The etching agent is designed for semiconductor substrates and is capable of etching titanium (Ti)-based metal films. This invention relates to a solution that comprises hydrogen peroxide, a phosphonic acid chelating agent with a hydroxyl group, a basic compound, and a copper anticorrosive. Additionally, he has developed a semiconductor surface treating agent composition that allows for the easy removal of anti-reflection coating layers at low temperatures and in a short time. This composition includes a compound that generates fluorine ions in water, a carbon radical generating agent, and water, with the option of including an organic solvent.
Career Highlights
Osamu Matsuda is currently employed at Wako Pure Chemical Industries, Inc., where he continues to innovate in the semiconductor field. His work has been instrumental in advancing technologies that improve the efficiency and effectiveness of semiconductor manufacturing.
Collaborations
Matsuda has collaborated with notable colleagues such as Nobuyuki Kikuchi and Ichiro Hayashida. Their combined expertise has contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Osamu Matsuda's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the manufacturing processes of semiconductor devices, showcasing the importance of innovation in technology.