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For the Inventor, By the Inventor

Nagano, Japan

Osamu Kobayashi

USPTO Granted Patents = 14

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 63(Granted Patents)


Location History:

  • Suwa, JP (1992 - 1996)
  • Nagano, JP (1991 - 1997)
  • Nagano-ken, JP (1996 - 2000)
  • Minowa-machi, JP (2011)
  • Minowa, JP (2014)

Company Filing History:

goldMedal14 out of 33,418 
 
Seiko Epson Corporation
 patents

Years Active: 1991-2014

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14 patents (USPTO):Explore Patents
1. 8830550 - Light deflector, method of manufacturing light deflector, and image display device (2014-09-09),
2. 7899375 - Developing apparatus, image forming apparatus, image forming system and image forming method (2011-03-01),
3. 6136099 - Rare earth-iron series permanent magnets and method of preparation (2000-10-24),
4. 5597425 - Rare earth cast alloy permanent magnets and methods of preparation (1997-01-28),
5. 5565043 - Rare earth cast alloy permanent magnets and methods of preparation (1996-10-15),
6. 5560784 - Rare earth cast alloy permanent magnets and methods of preparation (1996-10-01),
7. 5538565 - Rare earth cast alloy permanent magnets and methods of preparation (1996-07-23),
8. 5536334 - Permanent magnet and a manufacturing method thereof (1996-07-16),
9. 5460662 - Permanent magnet and method of production (1995-10-24),
10. 5352302 - Method of producing a rare-earth permanent magnet (1994-10-04),
11. 5213631 - Rare earth-iron system permanent magnet and process for producing the (1993-05-25),
12. 5186761 - Magnetic alloy and method of production (1993-02-16),
13. 5125988 - Rare earth-iron system permanent magnet and process for producing the (1992-06-30),
14. 5076861 - Permanent magnet and method of production (1991-12-31),

Title: The Innovative Contributions of Osamu Kobayashi

Introduction

Osamu Kobayashi is a prominent inventor based in Nagano, Japan. He has made significant contributions to the field of technology, particularly in the development of light deflectors and image display devices. With a total of 14 patents to his name, Kobayashi continues to push the boundaries of innovation.

Latest Patents

Kobayashi's latest patents include a light deflector, a method of manufacturing a light deflector, and an image display device. The light deflector features a movable plate and an elastic support section that allows for rotational movement around a predetermined axis. This design incorporates a light-absorbing section that enhances its functionality. Additionally, his work on a developing apparatus and image forming system showcases a developer carrier with concave portions that improve the efficiency of the image formation process.

Career Highlights

Kobayashi is currently employed at Seiko Epson Corporation, where he has been instrumental in advancing various technologies. His innovative designs and methods have contributed to the company's reputation for excellence in imaging and printing solutions.

Collaborations

Throughout his career, Kobayashi has collaborated with talented individuals such as Koji Akioka and Tatsuya Shimoda. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Osamu Kobayashi's work exemplifies the spirit of innovation in the technology sector. His contributions, particularly in light deflection and image display technologies, have had a lasting impact on the industry. As he continues to innovate, his influence will undoubtedly inspire future generations of inventors.

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