This inventor holds 4 USPTO granted patents. Top assignee: Japan Energy Corporation. Active years: 1995-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1995-2002
Title: Osamu Kano: Innovator in High-Purity Copper Sputtering Targets
Introduction
Osamu Kano is a notable inventor based in Kitaibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of high-purity copper sputtering targets and thin films. With a total of 4 patents to his name, Kano's work is essential for advancing technologies that require high-performance materials.
Latest Patents
Kano's latest patents include innovations in high-purity copper sputtering targets. These targets are designed to form deposition films with low electric resistance, which are crucial for high-speed operational elements. The high-purity copper sputtering target is characterized by having up to 0.1 ppm each of sodium and potassium, up to 1 ppm each of iron, nickel, chromium, aluminum, calcium, and magnesium, and up to 5 ppm each of carbon and oxygen. Additionally, it contains more than 99.999% copper, excluding gaseous constituents. The average grain size on the sputter surface is ideally 250 µm or below, with a dispersion of plus or minus 20%. Furthermore, the I(111)/I(200) ratio of X-ray diffraction peak intensity on the sputter plane is at least 2.4, also with a dispersion of plus or minus 20%. Another significant patent involves metal silicide targets for sputtering, which boast a density of at least 99% and minimal coarse silicon phases on the sputter surface.
Career Highlights
Osamu Kano is currently associated with Japan Energy Corporation, where he continues to innovate in the field of materials science. His work has been instrumental in enhancing the performance of sputtering targets, which are vital for various applications in electronics and other industries.
Collaborations
Kano has collaborated with several talented individuals in his field, including Yasuhiro Yamakoshi and Junichi Anan. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Osamu Kano's contributions to the field of high-purity copper sputtering targets and thin films highlight his role as a leading inventor in materials science. His innovative patents are paving the way for advancements in high-speed operational elements, showcasing the importance of his work in modern technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile