This inventor holds 2 USPTO granted patents. Top assignee: Fukuda Metal Foil & Powder Co., Ltd.. Active years: 2002-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002-2003
Title: Osamu Iwatsu: Innovator in Metal Powder Technology
Introduction
Osamu Iwatsu is a notable inventor based in Kobe, Japan. He has made significant contributions to the field of metal powder technology, holding a total of 2 patents. His innovative approaches have paved the way for advancements in the preparation of porous metal powders.
Latest Patents
Iwatsu's latest patents include a method for preparing porous metal powder and a method for preparing metal powder. The first patent describes a process where a starting metal is oxidized in the presence of chlorine and/or chloride, followed by reduction and milling to create a block metal body. This method results in prismatic particles that are intricately entangled, allowing for open pores in the metal powder. The second patent outlines a technique for producing metal powder by blowing a cooling liquid toward a flowing melt metal. This method utilizes an annular nozzle to create a hyperboloid shape, which helps in producing fine and spherical metal powder with a narrow particle size distribution.
Career Highlights
Iwatsu is currently associated with Fukuda Metal Foil & Powder Co., Ltd., where he continues to innovate in the field of metal powders. His work has been instrumental in enhancing the quality and efficiency of metal powder production.
Collaborations
Iwatsu has collaborated with notable colleagues such as Masato Kikukawa and Tadashi Koyama. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Osamu Iwatsu's contributions to metal powder technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and a drive to improve manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile