Location History:
- Hyogo, JP (1982)
- Sanda, JP (1985)
- Sodegaura, JP (1993)
- Tokyo, JP (1998 - 2019)
Company Filing History:
4 out of 21,351 
1 out of 1,297 
1 out of 943 Years Active: 1982-2019
Title: Osamu Ishihara: Innovator in Semiconductor Technology
Introduction
Osamu Ishihara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on advanced materials and methods that enhance the performance and reliability of electronic devices.
Latest Patents
Ishihara's latest patents include a block copolymer composition, molded material, resin composition, and molded product. One notable patent details a method of fabricating a thin film piezoelectric device. This method involves preparing a semiconductor substrate, forming an etch stopping layer, and creating a first semiconductor layer with a higher etching rate. The process continues with the formation of electrodes and a piezoelectric film, ultimately leading to the etching of a cavity in the semiconductor layer. This innovative approach allows for high controllability in producing cavities with uniform depth, even when using compound semiconductors.
Career Highlights
Throughout his career, Osamu Ishihara has worked with leading companies in the industry, including Mitsubishi Electric Corporation and Asahi Kasei Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and materials.
Collaborations
Ishihara has collaborated with notable professionals in his field, including Kenichi Harada and Takeshi Kuragaki. These partnerships have fostered innovation and advancements in semiconductor research and development.
Conclusion
Osamu Ishihara's contributions to semiconductor technology and his innovative patents highlight his role as a key figure in the industry. His work continues to influence the development of advanced electronic devices and materials.