Osaka, Japan

Osamu Doyasu

This inventor holds 1 USPTO granted patent. Top assignee: Pegasus Sewing Machine Mfg. Co., Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Doyasu. Retrieved from https://idiyas.com/inventor/osamu-doyasu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Osamu Doyasu: Innovator in Sewing Machine Technology

Introduction

Osamu Doyasu is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of sewing machine technology. His innovative designs have improved the efficiency and functionality of multi-needle double chain stitch sewing machines.

Latest Patents

Doyasu holds a patent for a "Regulating device for handling a needle thread in a multi-needle double chain stitch sewing machine." This invention features a thread taking-up tool attached to a needle bar, which has multiple thread holes arranged laterally. The device controls needle threads from a tension device to needles through vertical motion and cam face action, ensuring precise handling of threads during operation.

Career Highlights

Osamu Doyasu is associated with Pegasus Sewing Machine Mfg. Co., Ltd., a company renowned for its advanced sewing machine technologies. His work has been instrumental in enhancing the performance of sewing machines, making them more reliable and user-friendly.

Collaborations

Doyasu has collaborated with talented coworkers such as Hiroyuki Iuchi and Masahiko Nishikawa. Their combined expertise has contributed to the development of innovative solutions in the sewing machine industry.

Conclusion

Osamu Doyasu's contributions to sewing machine technology exemplify the impact of innovation in manufacturing. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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