Tokyo, Japan

Osamu Asai



Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 36(Granted Patents)


Location History:

  • Tokyo, JP (2010)
  • Shinjuku-ku, JP (2011 - 2017)

Company Filing History:


Years Active: 2010-2017

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4 patents (USPTO):Explore Patents

Title: Innovations of Osamu Asai in Photochromic Technology

Introduction

Osamu Asai is a notable inventor based in Tokyo, Japan, recognized for his contributions to the field of photochromic technology. With a total of 4 patents, Asai has made significant advancements that enhance the functionality and durability of photochromic materials.

Latest Patents

His latest patents include innovations such as a photochromic film and a photochromic lens comprising the same. The photochromic film features a unique composition that includes a photochromic dye and a resin component. Notably, this film exhibits a nanoindentation hardness of equal to or greater than 800 nm on at least one of its surfaces. Furthermore, Asai has developed a method for manufacturing photochromic lenses, which involves forming a photochromic film with a nanoindentation hardness ranging from 500 to 5000 nm on its outermost surface. This method utilizes a photochromic liquid that is coated on a mold and subjected to curing treatment, resulting in a high-quality photochromic lens.

Career Highlights

Osamu Asai is currently associated with Hoya Corporation, a leading company in optical products and solutions. His work at Hoya has allowed him to focus on the development of advanced photochromic technologies that cater to various applications in eyewear and other optical devices.

Collaborations

Asai has collaborated with esteemed colleagues such as Eiichi Yajima and Hiroshi Ohta, contributing to the innovative environment at Hoya Corporation. Their combined expertise has fostered the development of cutting-edge photochromic solutions.

Conclusion

Osamu Asai's contributions to photochromic technology exemplify the impact of innovation in enhancing optical materials. His patents and ongoing work continue to shape the future of this field, demonstrating the importance of research and development in creating advanced solutions.

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