Kyoto, Japan

Osami Taniuchi

This inventor holds 2 USPTO granted patents. Top assignees: Dainippon Screen Mfg. Co., Ltd., Other. Active years: 1989-1990.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1989-1990

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2 patents (USPTO):Explore Patents

Title: Osami Taniuchi: Innovator in Film Composition Technology

Introduction

Osami Taniuchi is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of film composition technology, holding a total of 2 patents. His innovative work has paved the way for advancements in the way original films are composed and adhered to base sheets.

Latest Patents

Taniuchi's latest patents include an apparatus for composing a plurality of original films on a base sheet. This apparatus is designed to position and adhere original films with precision. It features a main frame, a positioning and composing table for supporting base sheets, and film cassettes. Additionally, it includes a position detecting stage for placing original films, an original film carrier for transporting films, and a working head for applying adhesive. The apparatus is equipped with photoelectrical sensors to detect register marks and measure film positions, ensuring accuracy in the composition process.

Career Highlights

Throughout his career, Osami Taniuchi has worked with prominent companies, including Dainippon Screen Manufacturing Co., Ltd. His experience in the industry has allowed him to refine his inventions and contribute to technological advancements in film composition.

Collaborations

Taniuchi has collaborated with notable coworkers such as Tatsuo Yazaki and Hideaki Yonetani. Their combined expertise has further enhanced the development of innovative solutions in the field.

Conclusion

Osami Taniuchi's contributions to film composition technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the technical requirements necessary for advancing this field.

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