Haifa, Israel

Orr Dunkelman

This inventor holds 2 USPTO granted patents. Top assignees: Bar-Ilan University, Carmel—haifa University Economic Corp Ltd., Samsung Sds Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Orr Dunkelman. Retrieved from https://idiyas.com/inventor/orr-dunkelman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Orr Dunkelman

Introduction:

Orr Dunkelman, a distinguished inventor hailing from Haifa, Israel, is renowned for his groundbreaking contributions to the field of technology and cryptography.

Latest Patents:

Orr Dunkelman's latest patents showcase his expertise in developing cutting-edge encryption algorithms that have revolutionized data security in various industries.

Career Highlights:

Throughout his illustrious career, Orr Dunkelman has been instrumental in the development of advanced cryptographic techniques, earning him a reputation as a trailblazer in the field of cybersecurity. His innovative solutions have been pivotal in safeguarding sensitive information in an increasingly digital world.

Collaborations:

Orr Dunkelman has collaborated with leading tech companies and research institutions to further enhance the efficacy of encryption methods and strengthen cybersecurity measures on a global scale. His partnerships have resulted in the creation of robust systems that protect data integrity and confidentiality.

Conclusion:

In conclusion, Orr Dunkelman's relentless pursuit of innovation and his unwavering commitment to advancing the field of cryptography have solidified his position as a visionary inventor. His contributions continue to shape the landscape of cybersecurity, inspiring future generations to push the boundaries of technological possibility.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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