This inventor holds 4 USPTO granted patents. Top assignees: Applied Materials, Inc., Other. Active years: 2003-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Sunnyvale, CA (US) (2003 - 2004)
- Singapore, SG (2005)
Company Filing History:
3 out of 14,454 
1 out of 834,513 Years Active: 2003-2005
Title: Oranna Yauw: Innovator in Semiconductor Etching Technologies
Introduction
Oranna Yauw is a prominent inventor based in Sunnyvale, CA, known for his contributions to semiconductor etching technologies. With a total of 4 patents, he has made significant advancements in processes that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "High selectivity and residue free process for metal on thin dielectric gate etch application." This patent describes methods for etching electrodes formed directly on gate dielectrics. The process includes a main etch step, a soft landing step, and an over etch step. Another aspect of this patent involves performing a main etch that ensures good etch rate uniformity and profile uniformity, followed by a soft landing step to determine the metal/metal barrier interface. The over etch step selectively removes the metal barrier without negatively affecting the dielectric. Additionally, he has developed a "Self-cleaning process for etching silicon-containing material." This method involves placing a substrate in a process chamber and exposing it to an energized gas mixture, which includes fluorine-containing gas, chlorine-containing gas, and sidewall-passivation gas. The method is designed to etch regions of different compositions at similar rates.
Career Highlights
Oranna has worked with notable companies in the semiconductor industry, including Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to innovative solutions in the field.
Collaborations
Throughout his career, Oranna has collaborated with talented individuals such as Meihua Shen and Jeffrey D Chinn. These collaborations have further enriched his work and led to advancements in semiconductor technologies.
Conclusion
Oranna Yauw's innovative work in semiconductor etching processes has made a significant impact on the industry. His patents reflect a commitment to improving manufacturing techniques and enhancing the performance of semiconductor devices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile