Gainesville, FL, United States of America

Ololade D Oniku

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Innovations by Ololade D Oniku

Introduction

Ololade D Oniku is a notable inventor based in Gainesville, Florida. She has made significant contributions to the field of electroplated cobalt-platinum films, with a focus on improving the manufacturing processes and properties of these materials. Her work has led to advancements in magnetic properties and contamination mitigation in various applications.

Latest Patents

Ololade D Oniku holds two patents that showcase her innovative methods. The first patent describes a method of manufacturing electroplated cobalt-platinum films on substrates. This method includes depositing a diffusion barrier over a substrate, followed by a seed layer, and finally a cobalt-platinum magnetic layer. The second patent focuses on mitigating contamination of electroplated cobalt-platinum films. It involves a device that includes a substrate, a titanium nitride diffusion barrier layer, a titanium layer, a platinum seed layer, and a cobalt-platinum magnetic layer. Both patents emphasize improvements in the interfaces between layers and enhancements in magnetic properties after annealing.

Career Highlights

Ololade D Oniku is affiliated with the University of Florida Research Foundation, Incorporated. Her work at this institution has allowed her to explore innovative solutions in material science and engineering. She has demonstrated a commitment to advancing technology through her research and patent contributions.

Collaborations

Ololade has collaborated with David Patrick Arnold, who is also involved in her research endeavors. Their partnership has contributed to the development of new methodologies and improvements in their field.

Conclusion

Ololade D Oniku's contributions to the field of electroplated cobalt-platinum films highlight her innovative spirit and dedication to advancing technology. Her patents reflect significant advancements that can impact various applications in material science.

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