Gothenburg, Sweden

Olof Wranne

This inventor holds 2 USPTO granted patents. Top assignees: C Technologies Ab, Precise Biometrics Ab. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Olof Wranne. Retrieved from https://idiyas.com/inventor/olof-wranne

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 74(Granted Patents)


Company Filing History:


Years Active: 2000

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Olof Wranne: Innovator in Information Technology

Introduction

Olof Wranne is a notable inventor based in Goteborg, Sweden. He has made significant contributions to the field of information technology, particularly through his innovative patents. With a total of 2 patents, Wranne has demonstrated his expertise and creativity in developing solutions that enhance the way information is recorded and displayed.

Latest Patents

Wranne's latest patents include a device for recording and showing information and a card reader. These inventions reflect his commitment to improving technology and providing practical solutions for everyday challenges.

Career Highlights

Throughout his career, Olof Wranne has worked with several prominent companies, including C Technologies AB and Precise Biometrics AB. His experience in these organizations has allowed him to refine his skills and contribute to various projects that push the boundaries of technology.

Collaborations

Wranne has collaborated with talented individuals in the industry, including his coworker Oscar Strand. These partnerships have fostered innovation and have been instrumental in the development of his patents.

Conclusion

Olof Wranne's contributions to the field of information technology through his patents and collaborations highlight his role as an influential inventor. His work continues to inspire advancements in technology and improve the way we interact with information.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…