Company Filing History:
Years Active: 2011-2013
Title: Innovations by Olivier Rigoutat
Introduction
Olivier Rigoutat is a notable inventor based in Bethel, CT (US). He has made significant contributions to the field of plasma etching technology, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of bevel edge etching processes.
Latest Patents
Olivier's latest patents include methods for controlling bevel edge etching in a plasma chamber. One of the methods involves etching a film on the bevel edge of a substrate within a plasma etching chamber. This method includes providing the substrate on a support and utilizing a top and bottom edge electrode to surround the substrate support. The process gas is flowed through multiple edge gas feeds, which are strategically placed along the periphery of the gas delivery plate. Another patent addresses gas modulation to control edge exclusion in a bevel edge etching plasma chamber. This invention provides apparatus and methods for removing unwanted deposits near the bevel edge of substrates, thereby improving process yield. The use of center and edge gas feeds allows for the selection of optimal bevel edge etching processes.
Career Highlights
Olivier Rigoutat is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop innovative solutions that enhance the performance of plasma etching processes.
Collaborations
Olivier has collaborated with talented coworkers such as Tong Fang and Yunsang Kim. Their combined expertise has contributed to the advancement of technologies in the field of plasma etching.
Conclusion
Olivier Rigoutat's contributions to plasma etching technology through his patents and work at Lam Research Corporation highlight his role as an influential inventor. His innovative methods continue to push the boundaries of efficiency in the semiconductor industry.