Essex, United Kingdom

Olivier Morel

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Xennia Technology Limited. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Olivier Morel. Retrieved from https://idiyas.com/inventor/olivier-morel-ud9ovgps

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Olivier Morel - Innovator in Inkjet Technology

Introduction

Olivier Morel is a notable inventor based in Essex, GB. He has made significant contributions to the field of inkjet printing technology. His innovative approach has led to the development of advanced printhead designs that enhance printing efficiency and quality.

Latest Patents

Olivier holds a patent for an inkjet printhead that features at least one internal electrode in contact with ink during use. This design includes regions of the electrode surface that are covered by an electrically insulating organic material, which is deposited through electrophoresis. This innovation aims to improve the performance and reliability of inkjet printers.

Career Highlights

Olivier Morel is currently employed at Xennia Technology Limited, where he continues to push the boundaries of inkjet technology. His work has been instrumental in advancing the capabilities of printing systems, making them more efficient and versatile.

Collaborations

Olivier collaborates with Jonathan Andrew Barker, contributing to the development of innovative printing solutions. Their combined expertise enhances the research and development efforts at Xennia Technology Limited.

Conclusion

Olivier Morel's contributions to inkjet technology exemplify the spirit of innovation in the printing industry. His patent and ongoing work at Xennia Technology Limited highlight his commitment to advancing this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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