Molsheim, France

Olivier Lemoine

This inventor holds 1 USPTO granted patent. Top assignee: Zephyros, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Olivier Lemoine. Retrieved from https://idiyas.com/inventor/olivier-lemoine-qe2g4rtk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Olivier Lemoine: Inventor of a Structural Void-Filling Composition.

Introduction

Olivier Lemoine is an inventor associated with Molsheim, France, and Zephyros, Inc. His work includes a patent for a low-density, flame-retardant composition designed to fill structural voids.

Latest Patents

Lemoine’s listed patent, “Low Density Flame Retardant Two-Component Composition for Structural Void Filling,” describes a preferably epoxy-based material for reinforcing and filling structural gaps. It is intended for aircraft interior honeycomb sandwich structures, including edge close-outs, corners, mechanical fixation points, and complex gaps. The cured composition is designed to provide favorable fire, smoke, and toxicity properties, while also supporting practical storage, handling, extrusion, filling, grinding, and painting. The patent record lists 1 patent for Lemoine.

Career Highlights

Lemoine is associated with Zephyros, Inc., and his listed invention addresses structural reinforcement needs in aircraft interiors. The composition is described as compatible with both metal and non-metal construction materials.

Collaborations

Morgane Winkler and Nathalie Parent are identified as Lemoine’s coworkers. The available information does not specify their roles in the patent or invention.

Conclusion

Olivier Lemoine’s listed patent focuses on a versatile, low-density structural filler intended to support reinforcement and gap-filling applications in aircraft interiors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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