Nantes, France

Olivier Durand

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Soletanche Freyssinet, Université Gustave Eiffel. Active years: 2020.


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Olivier Durand: Innovator in Metal Wire Defect Detection

Introduction

Olivier Durand is a notable inventor based in Nantes, France. He has made significant contributions to the field of civil engineering through his innovative methods for detecting defects in metal wires. His work is particularly relevant for ensuring the integrity of structures that rely on metal cables.

Latest Patents

Olivier Durand holds a patent for a method designed to detect defects in a metal wire of a set of metal wires, specifically for anchoring areas in civil engineering structures. The patent describes a process that includes emitting a high-frequency ultrasound signal around a specific frequency in the metal wire, reflecting the signal within the wire, and receiving the reflected ultrasound signal. This method enables the energization of high-frequency waves that propagate longitudinally in the metal wire, enhancing the detection of potential defects.

Career Highlights

Throughout his career, Olivier Durand has worked with prominent organizations, including Soletanche Freyssinet and Université Gustave Eiffel. His experience in these institutions has allowed him to develop and refine his innovative techniques in the field of civil engineering.

Collaborations

Olivier has collaborated with notable colleagues such as Laurent Laguerre and Remi Colin. Their combined expertise has contributed to advancements in the methods used for defect detection in metal wires.

Conclusion

Olivier Durand's contributions to the field of civil engineering through his innovative patent demonstrate his commitment to enhancing safety and reliability in structural applications. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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