Dresden, Germany

Oliver Broermann

This inventor holds 3 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2005-2008.


% Patents Active = 33.3

Average Co-Inventor Count = 1.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005-2008

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3 patents (USPTO):Explore Patents

Title: Oliver Broermann: Innovator in Lithography Technology

Introduction

Oliver Broermann is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of lithography, particularly in the development of advanced mask technologies. With a total of 3 patents to his name, Broermann continues to push the boundaries of innovation in his field.

Latest Patents

Broermann's latest patents include a lithographic mask and a method for covering a mask layer. This invention discloses a lithographic mask that features a mask substrate and a patterned mask layer. The mask layer includes mask structures that can be transferred by lithography to a further substrate. The invention emphasizes the importance of a protective layer, which is applied in liquid form directly to the mask structures. This innovative approach enhances the reliability of the mask by preventing impurity particles from penetrating into the spacers between the structures of the mask layer.

Another significant patent involves a method for measuring a characteristic dimension of at least one pattern on a disc-shaped object in a measuring instrument. This method allows for the measurement of the width of a pattern on a semiconductor wafer or flat panel using optical or scanning electron microscopes. By employing a computing rule, the quality of correlation between measured data and reference data is assessed, ensuring high precision in measurements.

Career Highlights

Oliver Broermann is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of technology in the semiconductor industry.

Collaborations

Throughout his career, Broermann has collaborated with notable colleagues such as Uwe Paul Schroeder and Sebastian Schmidt. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Oliver Broermann is a distinguished inventor whose work in lithography technology has made a significant impact in the semiconductor industry. His innovative patents and contributions continue to shape the future of this field.

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